- Pharmaceuticals
- Fluorite
- Inorganic Fluorine Products
- Organic Fluorine Products
-
Fluorine-Containing Intermediates
- 4-Fluorobenzoyl chloride
- Fluorobenzene
- M-Trifluoromethylbenzeneacetonitrile
- 2,4-Dichloro-3,5-Dinitrobenzotrifluoride
- Ethiopromide
- 2-Bromoheptafluoropropane
- 2-Amino-5-Chloro-2'-Fluorobenzophenone
- 2-Fluoro-4-Bromoaniline
- 3,5-Difluorobromobenzene
- 3,4,5-Trifluorobromobenzene
- M-Fluorophenol
- Bromo-3-Fluorobenzene
- Pentafluorobenzyl Bromide
- Ethyl Difluoroacetate
- Ethyl Difluorobromoacetate
- Trifluorochloric Acid
- Special Rare Gases
-
Customized Product
- Trifluoromethoxybenzene Series
- Fluorinated Nitrobenzene Series
- Fluorinated Toluene Series
- Fluorinated Benzonitrile Series
- Fluorinated Benzoic Acid Series
- Fluorobenzaldehyde Series
- Fluorinated Anisole Series
- Fluorinated Phenol Series
- 3 - difluoromethyl-1-Methyl-1H-Pyrazole-4-Carboxlic Acid
- Boric Acid
- Urea Ammonium Nitrate Solution
- Other Customized Products
- Aprepitant--Adjuvant Anti-Vomiting For Cancer Chemotherapy
- Trifluoro Derivative Series
- Lithium Salt-LiTFSi Series
- Perfluorinated Series
-
Trifluorotoluene Series
- 2,4-Dichloro-3,5-Dinitrotrifluorotoluene
- M-Fluorotrifluorotoluene
- O-Fluorotrifluorotoluene
- P-Fluorotrifluorotoluene
- 2-Bromo-5-Fluorotrifluorotoluene
- 5-Bromo-2-Fluorotrifluorotoluene
- 5-Chloro-2-Nitrotrifluorotoluene
- 4-Fluoro-3-Trifluoromethylphenol
- P-Trifluoromethylthiophenol
- M-Ditrifluorotoluene
- 3.5-Bistrifluoromethylbromobenzene
- P-Ditrifluorotoluene
- 2. 4. 6-Trifluorobenzonitrile
XENON DIFLUORIDE ( F2Xe )
BRIEF DESCRIPTION
Xenon difluoride (XeF2), also known as xenon difluoride, is a colorless solid that easily sublimates at room temperature to form transparent crystals. Xenon difluoride decomposes in neutral or alkaline solutions and is relatively stable in acidic solutions. The aqueous solution has a pungent smell. Xenon difluoride vapor is colorless and has an odor . In the electronics industry, XeF2 is often used as an etching gas for silicon. Since the chemical reaction between XeF2 and silicon is a spontaneous reaction, XeF2 has a very high selectivity for the etching process of silicon. During the etching process of silicon by XeF2, the XeF2 gas By freely diffusing to the surface of the silicon substrate and chemically reacting with the outermost silicon atoms to generate gaseous Xe and gaseous SiF4, the corrosion of silicon is achieved.
TECHNICAL INDICATORS
Analysis |
Requirement |
Appearance |
white crystalline solid |
Purity(% by weight) |
99.99 |
Boiling Point 101.3 KPa (℃) |
114.35°C (estimate) |
Melting Point (℃) |
129 °C (lit.) |
Density25℃( g/mL ) |
4.32 g/mL at 25 °C (lit.) |
Purpose (USE)

STORAGE CONDITIONS
PACKAGE
CHEMICAL PROPERTIES

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